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The Effect of Discharge Chamber Geometry on the Characteristics of Low-Pressure RF Capacitive Discharges

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Title The Effect of Discharge Chamber Geometry on the Characteristics of Low-Pressure RF Capacitive Discharges
 
Creator Lisovskiy, V.
Booth, Jean-Paul
Landry, K.
Douai, D.
Cassagne, V.
Yegorenkov, V.
 
Subject plasma physics
gas discharges
 
Description We report the measured extinction curves and
current–voltage characteristics (CVCs) in several gases of RF capacitive discharges excited at 13.56 MHz in chambers of three
different geometries: 1) parallel plates surrounded by a dielectric cylinder (“symmetric parallel plate”); 2) parallel plates surrounded by a metallic cylinder (“asymmetric confined”); and 3) parallel plates inside a much larger metallic chamber (“asymmetric unconfined”), similar to the gaseous electronics conference reference cell. The extinction curves and the CVCs show
differences between the symmetric, asymmetric confined, and asymmetric unconfined chamber configurations. In particular, the discharges exist over a much broader range of RF voltages and gas
pressures for the asymmetric unconfined chamber. For symmetric and asymmetric confined discharges, the extinction curves are close to each other in the regions near the minima and at lower pressure, but at higher pressure, the extinction curve of the asymmetric confined discharge runs at a lower voltage than the one for the discharge in a symmetric chamber. In the particular cases of an “asymmetric unconfined chamber” discharge or “asymmetric confined” one, the RF discharge experiences the transition
from a “weak-current” mode to a “strong-current” one at lower RF voltages than is the case for a “symmetric parallel-plate”
discharge.
 
Date 2010-11-17T20:17:14Z
2010-11-17T20:17:14Z
2007-04
 
Type Article
 
Identifier IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 35, NO. 2, APRIL 2007
http://dspace.univer.kharkov.ua/handle/123456789/1703
 
Language en
 
Relation ;Digital Object Identifier 10.1109/TPS.2007.893261
 
Publisher IEEE TRANSACTIONS ON PLASMA SCIENCE