Field Emission Behaviour of the Single Wall Carbon Nanotubes Grown by Plasma Enhanced Chemical Vapour Deposition (PECVD) System
Electronic Archive of Sumy State University
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Title |
Field Emission Behaviour of the Single Wall Carbon Nanotubes Grown by Plasma Enhanced Chemical Vapour Deposition (PECVD) System
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Creator |
Kumar, Avshish
Parveen, Shama Husain, Samina Ali, Javid Harsh Husain, M. |
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Subject |
Carbon nanotubes
PECVD RF sputtering Field emission Scanning electron microscopy Raman |
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Description |
Single wall carbon nanotubes have been grown on Fe using Plasma Enhanced Chemical Vapour Deposition (PECVD) system. The thickness of the Fe film prepared by RF sputtering system was about 10 nm. The field emission characteristic was measured which showed good enhancement factor. The grown CNTs were characterized by various techniques such as SEM, Raman study etc. |
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Publisher |
Сумський державний університет
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Date |
2013-06-19T11:31:08Z
2013-06-19T11:31:08Z 2013 |
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Type |
Article
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Identifier |
Avshish Kumar, Shama Parveen, Samina Husain, et al., J. Nano- Electron. Phys. 5 No 2, 02012 (2013)
http://essuir.sumdu.edu.ua/handle/123456789/31006 |
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Language |
en
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