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Field Emission Behaviour of the Single Wall Carbon Nanotubes Grown by Plasma Enhanced Chemical Vapour Deposition (PECVD) System

Electronic Archive of Sumy State University

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Title Field Emission Behaviour of the Single Wall Carbon Nanotubes Grown by Plasma Enhanced Chemical Vapour Deposition (PECVD) System
 
Creator Kumar, Avshish
Parveen, Shama
Husain, Samina
Ali, Javid
Harsh
Husain, M.
 
Subject Carbon nanotubes
PECVD
RF sputtering
Field emission
Scanning electron microscopy
Raman
 
Description Single wall carbon nanotubes have been grown on Fe using Plasma Enhanced Chemical Vapour Deposition (PECVD) system. The thickness of the Fe film prepared by RF sputtering system was about 10 nm.
The field emission characteristic was measured which showed good enhancement factor. The grown CNTs were characterized by various techniques such as SEM, Raman study etc.
 
Publisher Сумський державний університет
 
Date 2013-06-19T11:31:08Z
2013-06-19T11:31:08Z
2013
 
Type Article
 
Identifier Avshish Kumar, Shama Parveen, Samina Husain, et al., J. Nano- Electron. Phys. 5 No 2, 02012 (2013)
http://essuir.sumdu.edu.ua/handle/123456789/31006
 
Language en