Запис Детальніше

Some Aspects of Phosphorus Diffusion in Germanium in In0,01Ga0,99As / In0,56Ga0,44P / Ge Heterostructures

Electronic Archive of Sumy State University

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Поле Співвідношення
 
Title Some Aspects of Phosphorus Diffusion in Germanium in In0,01Ga0,99As / In0,56Ga0,44P / Ge Heterostructures
 
Creator Kobeleva, S.P.
Anfimov, I.M.
Yurchuk, S.Y.
Turutin, A.V.
 
Subject Multi cascade solar cell
Diffussion of P in Ge
Diffusion of Ga in Ge
Heterostructure
 
Description The results of experimental and theoretical researches of phosphorus distribution in the first cascade of a multi cascade solar cell based on nanoscale structures AIIIBV / Ge are presented. Secondary ion mass spectroscopy has been applied to obtain profiles of phosphorus and gallium in In0.01Ga0.99As / In0.56Ga0.44P / Ge heterostructure. In the germanium surface there is a thin layer of about 26 nm, in which the gallium concentration exceeds the concentration of phosphorus. Therefore a nanoscale p-n junction forms that does not have a significant impact on the solar cells performance at room temperature. Phosphorus diffusion is much slower in this area than in area with electronic conductivity. The main p-n junction is formed at a distance of 130-150 nm from the surface of the germanium. Diffusivity of gallium (DGa = 1,4×10 – 15 cm2/s) is markedly higher than described in a literature. Diffusivity of P increase from DP = 3×10-15 cm2/s on the boundary of the heterostructure In0, 49Ga0, 51P to DP = 5,2×10 – 14 cm2/s in n-type Ge.
When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/33648
 
Publisher Сумський державний університет
 
Date 2014-01-18T07:41:25Z
2014-01-18T07:41:25Z
2013
 
Type Article
 
Identifier S.P. Kobeleva, I.M. Anfimov, S.Y. Yurchuk, A.V. Turutin, J. Nano- Electron. Phys. 5 No 4, 04021 (2013)
http://essuir.sumdu.edu.ua/handle/123456789/33648
 
Language en