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Comparative Characteristics of Stress and Structure of TiN and Ti0.5-xAl0.5YxN Coatings Prepared by Filtered Vacuum-Arc PIIID Method

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Title Comparative Characteristics of Stress and Structure of TiN and Ti0.5-xAl0.5YxN Coatings Prepared by Filtered Vacuum-Arc PIIID Method
 
Creator Vasyliev, V.V.
Luchaninov, A.A.
Reshetnyak, E.N.
Strelnitskij, V.E.
 
Subject Nitride coatings
Solid solution
Filtered vacuum arc deposition
Pulsed substrate bias
Residual stress
 
Description A comparative study of the structure and stress state of Ti0.5-xAl0.5YxN and TiN coatings deposited under
identical conditions from the filtered vacuum-arc plasma under high voltage pulsed bias potential on
the substrate was carried out. It was found that for Ti0.5Al0.5N coatings the dependence of the residual
stress on the amplitude of the pulsed voltage potential is non-monotonic with a minimum when the amplitude
is of 1 kV. As for TiN films, a monotonic decrease in the level of residual stresses takes place when the
amplitude of the potential is increased in the range 0-2.5 kV. Non-monotonic dependence for multicomponent
coatings Ti-Al-Y-N may occur due to the possibility of phase transition associated with the decay
of the supersaturated solid solution (Ti,Al)N stimulated by high energy ion bombardment.
 
Publisher Sumy State University
 
Date 2014-05-23T10:17:05Z
2014-05-23T10:17:05Z
2012
 
Type Article
 
Identifier Comparative Characteristics of Stress and Structure of TiN and Ti0.5-xAl0.5YxN Coatings Prepared by Filtered Vacuum-Arc PIIID Method / V. V. Vasyliev, A. A. Luchaninov, E. N. Reshetniak, V. E. Strelnitskij // Nanomaterials: Applications & Properties (NAP-2012) : 2-nd International conference, Alushta, the Crimea, September 17-22, 2012 / Edited by: A. Pogrebnjak. - Sumy : Sumy State University, 2012. - V. 1, No2. - 02NFC24-02NFC24
http://essuir.sumdu.edu.ua/handle/123456789/34913
 
Language en