Ge/GaAs(100) Thin Films: Large Effect of Film Growth Rate and Thicknesses on Surface Morphology, Intrinsic Stresses and Electrical Properties
Electronic Archive of Sumy State University
Переглянути архів Інформація| Поле | Співвідношення | |
| Title |
Ge/GaAs(100) Thin Films: Large Effect of Film Growth Rate and Thicknesses on Surface Morphology, Intrinsic Stresses and Electrical Properties
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| Creator |
Mitin, V.F.
Lytvyn, P.M. Kholevchuk, V.V. Matveeva, L.A. Mitin, V.V. Kulyk, O.S. Venger, E.F. |
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| Subject |
Ge/GaAs
Electrical properties Intrinsic stresses Surface morphology |
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| Description |
We found out and studied a profound effect of film growth rate on the electrical properties, intrinsic stresses and surface morphology of thin Ge films grown on GaAs(100). This effect is essential and has to be accounted for when developing and producing devices based on the Ge/GaAs heterostructure. All the Ge films under investigation were single-crystalline and epitaxially-grown on the GaAs(100) substrates. However, the transport phenomena in Ge films grown at low and high deposition rate differed drastically. Those obtained at low deposition rate were p-type and high resistant. They had a low concentration of free charge carriers and thermally activated conductivity, which is characteristic of heavily doped and strongly (in the limiting case, fully) compensated semiconductors. Although such films were single-crystalline, their conductivity was percolation-type. The Ge films obtained at high deposition rate were n-type and low resistant. They had high concentration of free charge carriers. The temperature dependence of conductivity in such films was weak or practically absent, which is characteristic of degenerate heavily doped semiconductors. Besides, the surface morphology cardinally differed for films obtained at low and high deposition rate. At low film growth rates, surfaces with developed relief were observed whose valleys and ridges formed grains of irregular shape with pronounced substructure. As the film thickness grew, the surface relief became essentially pronounced. At rather high film deposition rates, contrary to the above, the Ge film surface was fine-grained and smooth; the surface relief practically did not depend on the film thickness. As the deposition rate went down, the intrinsic stresses in films essentially decreased. The results obtained were analyzed from the viewpoint of formation of compositional and morphological inhomogeneities, and fluctuations of electrostatic potential at low growth rates. Such potential fluctuations modulate Ge energy bands leading to appearance of potential relief and deep tails of density of states in the Ge bandgap. |
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| Publisher |
Sumy State University
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| Date |
2014-05-27T06:14:22Z
2014-05-27T06:14:22Z 2012 |
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| Type |
Article
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| Identifier |
Ge/GaAs(100) Thin Films: Large Effect of Film Growth Rate and Thicknesses on Surface Morphology, Intrinsic Stresses and Electrical Properties / V. F. Mitin, P. M. Lytvyn, V. V. Kholevchuk et al.
// Nanomaterials: Applications & Properties (NAP-2012) : 2-nd International conference, Alushta, the Crimea, September 17-22, 2012 / Edited by: A. Pogrebnjak. - Sumy : Sumy State University, 2012. - V.1, No3. - 03TF17
http://essuir.sumdu.edu.ua/handle/123456789/35066 |
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| Language |
en
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