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Porous Silicon Templates with High Aspect Ratio for Nanocomposites Formation

Electronic Archive of Sumy State University

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Title Porous Silicon Templates with High Aspect Ratio for Nanocomposites Formation
 
Creator Redko, S.V.
Chubenko, E.B.
Klyshko, A.A.
 
Subject Porous silicon
Template
Nanocomposites
 
Description The paper describes the fabrication process of templates with high aspect ratio suitable for formation of
nanomposites with enhanced anisotropy. The templates are thick ordered porous silicon layers formed with
the pulsed galvanostatic mode. Characteristic feature of the developed mode is a short reversed polarity
pulse of certain amplitude. In the present paper the achieved thickness of porous silicon templates is
50 m with pore diameter 80 nm. The aspect ratio of those structures 1:600. The maximum thickness of
formed silicon layers is not principally limited allowing obtaining nanostructures with even higher aspect
ratio.
 
Publisher Sumy State University
 
Date 2014-05-27T07:10:56Z
2014-05-27T07:10:56Z
2012
 
Type Article
 
Identifier Redko, S. V. Porous Silicon Templates with High Aspect Ratio for Nanocomposites Formation / S. V. Redko, E. B. Chubenko, A. A. Klyshko // Nanomaterials: Applications & Properties (NAP-2012) : 2-nd International conference, Alushta, the Crimea, September 17-22, 2012 / Edited by: A. Pogrebnjak. - Sumy : Sumy State University, 2012. - V. 1, No3. - 03CNN10
http://essuir.sumdu.edu.ua/handle/123456789/35088
 
Language en