Porous Silicon Templates with High Aspect Ratio for Nanocomposites Formation
Electronic Archive of Sumy State University
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Title |
Porous Silicon Templates with High Aspect Ratio for Nanocomposites Formation
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Creator |
Redko, S.V.
Chubenko, E.B. Klyshko, A.A. |
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Subject |
Porous silicon
Template Nanocomposites |
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Description |
The paper describes the fabrication process of templates with high aspect ratio suitable for formation of nanomposites with enhanced anisotropy. The templates are thick ordered porous silicon layers formed with the pulsed galvanostatic mode. Characteristic feature of the developed mode is a short reversed polarity pulse of certain amplitude. In the present paper the achieved thickness of porous silicon templates is 50 m with pore diameter 80 nm. The aspect ratio of those structures 1:600. The maximum thickness of formed silicon layers is not principally limited allowing obtaining nanostructures with even higher aspect ratio. |
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Publisher |
Sumy State University
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Date |
2014-05-27T07:10:56Z
2014-05-27T07:10:56Z 2012 |
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Type |
Article
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Identifier |
Redko, S. V.
Porous Silicon Templates with High Aspect Ratio for Nanocomposites Formation / S. V. Redko, E. B. Chubenko, A. A. Klyshko
// Nanomaterials: Applications & Properties (NAP-2012) : 2-nd International conference, Alushta, the Crimea, September 17-22, 2012 / Edited by: A. Pogrebnjak. - Sumy : Sumy State University, 2012. - V. 1, No3. - 03CNN10
http://essuir.sumdu.edu.ua/handle/123456789/35088 |
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Language |
en
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