Influence of Ion Current Density on the Properties of Vacuum Arc-deposited TiN Coating
Electronic Archive of Sumy State University
Переглянути архів Інформація| Поле | Співвідношення | |
| Title |
Influence of Ion Current Density on the Properties of Vacuum Arc-deposited TiN Coating
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| Creator |
Baranov, O.O.
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| Subject |
DC discharges
Ion-assisted deposition Thin films |
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| Description |
Influence of ion current density on the thickness of coating deposited in the vacuum arc setup has been investigated. A planar probe was used to measure the ion current density distribution across plasma flux at a distance of 250 mm from the plasma duct exit. The current density from 20 to 50 A/m2 was obtained, depending on the probe position relative to the substrate center. TiN coatings were deposited onto cutting inserts placed at different locations on the substrate, and SEM technique was used to characterize surfaces of the coatings. It was found that low-dense coatings were formed at the decreased ion current density. A quantitative dependence of the coating thickness on the ion current density in the range of 20 to 50 A/m2 were obtained for the films deposited at substrate bias of 200 V and nitrogen pressure 0.1 Pa. The results may be useful for controlling ion flux distribution over the large substrates.
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| Publisher |
Sumy State University
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| Date |
2014-05-28T07:12:35Z
2014-05-28T07:12:35Z 2013 |
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| Type |
Article
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| Identifier |
Baranov, O.O. Influence of Ion Current Density on the Properties of Vacuum Arc-deposited TiN Coating [Текст] / O.O. Baranov
// Nanomaterials: Applications & Properties (NAP-2013) : 2-nd International conference, Alushta, the Crimea, September 17-22, 2012 / Edited by: A. Pogrebnjak. - Sumy : Sumy State University, 2013. - V.2, No1. - 01PCSI03
http://essuir.sumdu.edu.ua/handle/123456789/35250 |
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| Language |
en
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