Plasma Processing Reactor on a Base of Beam Plasma Discharge for Producing and Processing Nanomaterials
Electronic Archive of Sumy State University
Переглянути архів Інформація| Поле | Співвідношення | |
| Title |
Plasma Processing Reactor on a Base of Beam Plasma Discharge for Producing and Processing Nanomaterials
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| Creator |
Shustin, E.G.
Isaev, N.V. Klykov, I.L. Peskov, V.V. |
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| Subject |
Plasma processing reactor
Beam plasma discharge Etching Deposition Graphene |
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| Description |
The paper describes the design, modes and applications of novel kind of low pressure plasma processing reactor based on beam plasma discharge as the plasma source. This reactor ensures flawless treatment of material surface as well as deposition of specific coatings with strictly defined energy of ions acting upon a treated surface. Applications of the reactor are represented such as defect-free etching heterostructures based on GaAs and producing structurally perfect samples of graphene. |
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| Publisher |
Sumy State University
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| Date |
2014-05-29T09:49:40Z
2014-05-29T09:49:40Z 2012 |
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| Type |
Article
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| Identifier |
Plasma Processing Reactor on a Base of Beam Plasma Discharge for Producing and Processing Nanomaterials / E. G. Shustin, N. V. Isaev, I. L. Klykov, V. V. Peskov
// Nanomaterials: Applications & Properties (NAP-2012) : 2-nd International conference, Alushta, the Crimea, September 17-22, 2012 / Edited by: A. Pogrebnjak. - Sumy : Sumy State University, 2012. - V. 1, No4. - 04PITSE08
http://essuir.sumdu.edu.ua/handle/123456789/35407 |
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| Language |
en
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