Influence of Deuterium Ion Implantation on the Structure and Hardness of Nanocrystalline Films
Electronic Archive of Sumy State University
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Title |
Influence of Deuterium Ion Implantation on the Structure and Hardness of Nanocrystalline Films
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Creator |
Kuprin, A.S.
Tolmachova, G.N. Belous, V.A. Lomino, N.S. Ovcharenko, V.D. Reshetnyak, E.N. Morozov, O.M. Zhurba, V.I. |
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Subject |
Vacuum arc
Nanostructured coatings Hardness Implantation Deuterium Thermal desorption |
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Description |
Titanium nitride based coatings are very attractive for protection of materials in extreme conditions. However, their behavior under different kinds of irradiation is not entirely well understood. In this work, the influence of ion-implanted deuterium on changes of the structure and mechanical properties TiZrN, TiAlSiN, TiAlYN films were investigated. Films were deposited by filtered vacuum arc plasma technique. After deposition all films were irradiated at room temperature with 12 keV D+ ions to dose 1 1018 D/cm2. Composition, structure and nanohardness of the coatings were determined by X-ray fluorescence method, X-ray diffraction and nanoindentation. The effusion of the implanted deuterium was studied by thermal desorption spectroscopy. It is shown that irradiation by deuterium ions does not make structural changes in multicomponent films. Deuterium thermal desorption spectrum of various coatings are substantially different. Nanohardness of all investigated coatings after irradiation and thermal desorption are decreased. |
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Publisher |
Sumy State University
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Date |
2014-05-29T11:38:39Z
2014-05-29T11:38:39Z 2012 |
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Type |
Article
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Identifier |
Influence of Deuterium Ion Implantation on the Structure and Hardness of Nanocrystalline Films / A. S. Kuprin, G. N. Tolmachova, V. A. Belous et al.
// Nanomaterials: Applications & Properties (NAP-2012) : 2-nd International conference, Alushta, the Crimea, September 17-22, 2012 / Edited by: A. Pogrebnjak. - Sumy : Sumy State University, 2012. - V. 1, No4. - 04RES07
http://essuir.sumdu.edu.ua/handle/123456789/35453 |
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Language |
en
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