Managing the Composition of the Plasma Flow of the Technological Plasma Sources by Changing the Temperature of the Cathode Working Surface
Electronic Archive of Sumy State University
Переглянути архів Інформація| Поле | Співвідношення | |
| Title |
Managing the Composition of the Plasma Flow of the Technological Plasma Sources by Changing the Temperature of the Cathode Working Surface
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| Creator |
Sysoev, Yu.
Tatarkina, I. |
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| Subject |
Plasma source
Cathode working surface temperature Vacuum arc Dripping fraction |
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| Description |
The problems of managing the amount of drop fraction in the plasma flow of technological plasma vac-uum-arc discharge sources by controlling the changing the cathode surface temperature were considered. The possibilities for regulation and stabilization of cathode surface temperature by cooling the front and the lateral cathode surface were investigated. Designs of cathode assemblies in which the control of tem-perature of the working surface cathode is exercised by changing the coolant flow rate and by changing dis-tance between the cathode working surface and its cooling area were developed.
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| Publisher |
Sumy State University
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| Date |
2014-06-03T09:09:49Z
2014-06-03T09:09:49Z 2013 |
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| Type |
Article
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| Identifier |
Sysoev, Yu. Managing the Composition of the Plasma Flow of the Technological Plasma Sources by Changing the Temperature of the Cathode Working Surface [Текст] / Yu. Sysoev, I. Tatarkina // Nanomaterials: Applications & Properties (NAP-2013) : 2-nd International conference, Alushta, the Crimea, September 17-22, 2012 / Edited by: A. Pogrebnjak. - Sumy: Sumy State University, 2013. - V.2, No3. - 03AET02
http://essuir.sumdu.edu.ua/handle/123456789/35599 |
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| Language |
en
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