Immersion Lithography with Using of Photostimulated Etching of Germanium Chalcogenide Films
Electronic Archive of Sumy State University
Переглянути архів Інформація| Поле | Співвідношення | |
| Title |
Immersion Lithography with Using of Photostimulated Etching of Germanium Chalcogenide Films
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| Creator |
Danko, V.A.
Indutnyi, I.Z. Mynko, V.I. Shepeliavyi, P.E. Lykanyuk, M.V. Litvin, O.S. |
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| Subject |
Chalcogenide Glasses
Photo-induced Dissolution |
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| Description |
The new effect of photo-stimulated dissolution of as-evaporated and annealed Ge-based chalcogenide glass (ChG) films was investigated. The etching rate increases with the illumination intensity, and its spectral dependence is correlated with absorption in the film at the absorption edge. The high-frequency diffraction gratings on germanium ChG - more environmentally acceptable compounds than traditionally used arsenic chalcogenides, were recorded by method of interference immersion photolithography with photoinduced etching.
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| Publisher |
Sumy State University
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| Date |
2014-06-04T08:58:38Z
2014-06-04T08:58:38Z 2013 |
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| Type |
Article
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| Identifier |
Immersion Lithography with Using of Photostimulated Etching of Germanium Chalcogenide Films [Текст] / V.A. Danko, I.Z. Indutnyi, V.I. Mynko et al. // Nanomaterials: Applications & Properties (NAP-2013): 2-nd International conference, Alushta, the Crimea, September 17-22, 2012 / Edited by: A. Pogrebnjak. - Sumy: Sumy State University, 2013. - V.2, No3. - 03AET03
http://essuir.sumdu.edu.ua/handle/123456789/35630 |
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| Language |
en
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