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Evaluation of Vertical Coherence Length, Twist and Microstrain of GaAs / Si Epilayers Using Modified Williamson-Hall Analysis

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Title Evaluation of Vertical Coherence Length, Twist and Microstrain of GaAs / Si Epilayers Using Modified Williamson-Hall Analysis
 
Creator Ravi Kumar
Tapas Ganguli
Vijay Chouhan
Dixit, V.K.
Puspen Mondal
Srivastava, A.K.
Mukherjee, C.
Sharma, T.K.
 
Subject HRXRD
GaAs / Si
Anti Phase domain
Microstructure
Williamson-Hall analysis
 
Description Modified Williamson-Hall (WH) analysis is used to determine the reliable values of the microstructures for
Zincblende epilayers grown on non-polar substrates. Systematic high resolution X-ray diffraction (HRXRD) experiments
are performed for several skew symmetric reflections which enable an accurate measurement of the
values of vertical coherence length (VCL) and microstrain of GaAs epilayers grown on Si. Furthermore, a simple
method based on the orientation of Burgers vector is proposed for estimating the ratio of tilt and twist. In this
method, the twist can be found easily once tilt is known. It is rather quick and the measured values of twist are
very similar to those which are otherwise estimated by acquiring numerous HRXRD scans along with tedious
fitting procedures. Presence of 60 mixed dislocations is confirmed from the cross sectional high resolution
transmission electron microscope images of GaAs / Si samples. Furthermore, the estimated value of VCL is
equivalent to the layer thickness measured by the surface profiler.
 
Publisher Sumy State University
 
Date 2014-07-25T11:14:12Z
2014-07-25T11:14:12Z
2014
 
Type Article
 
Identifier Ravi Kumar, Tapas Ganguli, Vijay Chouhan, et al., J. Nano- Electron. Phys. 6 No 2, 02010 (2014)
http://essuir.sumdu.edu.ua/handle/123456789/35988
 
Language en