RF Magnetron Sputtering of Silicon Carbide and Silicon Nitride Films for Solar Cells
Electronic Archive of Sumy State University
Переглянути архів Інформація| Поле | Співвідношення | |
| Title |
RF Magnetron Sputtering of Silicon Carbide and Silicon Nitride Films for Solar Cells
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| Creator |
Zakhvalinskii, V.S.
Piljuk, E.A. Goncharov, I.Yu. Rodriges, V.G. Kuzmenko, A.P. Taranenko, S.V. Abakumov, P.A. |
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| Subject |
Atomic force microscopy
RF- magnetron sputtering Silicon carbide Silicon nitride Thin films Solar cells |
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| Description |
RF-magnetron nonreactive sputtering method from solid-phase target in argon atmosphere was used for obtaining thin silicon carbide and silicon nitride films, that are used for constructing solar cells based on substrates of single crystal silicon of p-type. |
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| Publisher |
Sumy State University
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| Date |
2014-07-31T11:55:10Z
2014-07-31T11:55:10Z 2014 |
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| Type |
Article
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| Identifier |
RF-magnetron nonreactive sputtering method from solid-phase target in argon atmosphere was used
for obtaining thin silicon carbide and silicon nitride films, that are used for constructing solar cells based
on substrates of single crystal silicon of p-type.
http://essuir.sumdu.edu.ua/handle/123456789/36380 |
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| Language |
en
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