Запис Детальніше

Pressure-induced structural transformations in Si:V and Si:V, Mn

Vernadsky National Library of Ukraine

Переглянути архів Інформація
 
 
Поле Співвідношення
 
Title Pressure-induced structural transformations in Si:V and Si:V, Mn
 
Creator Misiuk, A.
Barcz, A.
Chow, L.
Bak-Misiuk, J.
Romanowski, P.
Shalimov, A.
Wnuk, A.
Surma, B.
Vanfleet, R.
Prujszczyk, M.
 
Description Semiconductors doped with magnetically active atoms are expected to find application in spintronics. Si samples implanted with Mn⁺ (Si:Mn) or with V⁺ (Si:V) can order magnetically after processing at high temperature (HT) and also under enhanced hydrostatic pressure (HP). This work presents new results on structure-related properties of single crystalline Si implanted at 200 keV with V⁺ as well as that co-implanted additionally with Mn⁺ ions (Si:V, Mn), with dosages DV⁺ ≤ 5·10¹⁵ cm⁻² and DMn⁺ = 1·10¹⁵ cm⁻². The samples were processed for 1–5 h at HT ≤ 1270 K under HP ≤ 1.1 GPa. Secondary Ion Mass Spectrometry, Transmission Electron Microscopy, X-ray and related methods were applied for sample characterization. The HT- (HP) treatment affects, among others, solid phase epitaxial re-growth (SPER) of amorphous silicon created at implantation and distribution of implanted species.
 
Date 2014-11-06T18:23:35Z
2014-11-06T18:23:35Z
2008
 
Type Article
 
Identifier Pressure-induced structural transformations in Si:V and Si:V, Mn / A. Misiuk, A. Barcz, L. Chow, J. Bak-Misiuk, P. Romanowski, A. Shalimov, A. Wnuk, B. Surma, R. Vanfleet, M. Prujszczyk // Физика и техника высоких давлений. — 2008. — Т. 18, № 4. — С. 105-111. — Бібліогр.: 12 назв. — англ.
0868-5924
PACS: 61.72.Tt, 61.72.–y, 62.50.+p, 78.30.Am
http://dspace.nbuv.gov.ua/handle/123456789/70463
 
Language en
 
Relation Физика и техника высоких давлений
 
Publisher Донецький фізико-технічний інститут ім. О.О. Галкіна НАН України