ZnO:Al wide zone “windows” deposited by magnetron sputtering on unheated substrate
Vernadsky National Library of Ukraine
Переглянути архів Інформація| Поле | Співвідношення | |
| Title |
ZnO:Al wide zone “windows” deposited by magnetron sputtering on unheated substrate
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| Creator |
Boyko, B.Т.
Khrypunov, G.S. Yurchenko, G.V. |
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| Subject |
Пленочные материалы и покрытия
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| Description |
Electrical and optical properties of ZnO:Al films deposited on unheated glass substrate by non-reactive RF magnetron sputtering of target ZnO:Al₂O₃ (98/2 wt.%) were studied. It was shown that Zno:Al films with the thickness of 0.75 µm deposited at the magnetron power 130 W and 4 µbar argon pressure with adding of 4·10⁻³ µbar oxygen pressure during the first minute of condensation has the following electrical and optical characteristics: surface, resistance 6 Ω/ and transmittance in visible spectral range about 88%. The ZnO:Al films with such optical and electrical parameters are suitable for substrate configuration highly efficiency thin film solar cells on CuInSe₂ base.
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| Date |
2015-03-13T06:42:36Z
2015-03-13T06:42:36Z 2000 |
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| Type |
Article
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| Identifier |
ZnO:Al wide zone “windows” deposited by magnetron sputtering on unheated substrate / B.Т. Boyko, G.S. Khrypunov, G.V. Yurchenko // Вопросы атомной науки и техники. — 2000. — № 5. — С. 91-93. — Бібліогр.: 10 назв. — англ.
1562-6016 http://dspace.nbuv.gov.ua/handle/123456789/78239 537. 221:537.221 |
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| Language |
en
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| Relation |
Вопросы атомной науки и техники
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| Publisher |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
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