Simulation of formation of an intensive electron beam in bipolar electron-optical system with the plasma anode
Vernadsky National Library of Ukraine
Переглянути архів ІнформаціяПоле | Співвідношення | |
Title |
Simulation of formation of an intensive electron beam in bipolar electron-optical system with the plasma anode
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Creator |
Stekolnikov, A.F.
Gruzdev, V.A. Petrovich, O.N. |
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Subject |
Plasma electronics
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Description |
The algorithm of numerical simulation of electrons sources in base of the high-voltage glow discharge with the anode plasma, taking into account change of the form and the location of a surface of anode plasma, that renders essential influence on formation of an ion stream, which at hit on the cold cathode as a result of secondary ion - electronic emission forms an electron beam, is offered. As against other algorithms the offered physics-mathematical model takes into account influence on distribution of potential not only an ion space charge, but also a space charge of beam electrons, distribution of potential in turn defines as a trajectory the beam electrons and a stream of ions, and position of plasma edge which movement is considered during formation of a beam according to Stefan's condition.
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Date |
2015-03-30T09:26:43Z
2015-03-30T09:26:43Z 2002 |
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Type |
Article
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Identifier |
Simulation of formation of an intensive electron beam in bipolar electron-optical system with the plasma anode / A.F. Stekolnikov, V.A. Gruzdev, O.N. Petrovich // Вопросы атомной науки и техники. — 2002. — № 5. — С. 113-114. — Бібліогр.: 2 назв. — англ.
1562-6016 PACS: 52.65.-y http://dspace.nbuv.gov.ua/handle/123456789/79283 |
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Language |
en
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Relation |
Вопросы атомной науки и техники
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Publisher |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
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