Large-area surface wave plasma source
Vernadsky National Library of Ukraine
Переглянути архів Інформація| Поле | Співвідношення | |
| Title |
Large-area surface wave plasma source
|
|
| Creator |
Azarenkov, N.A.
Bizyukov, A.A. Sereda, K.N. Tseluyko, A.Ph. Yunakov, N.N. Gapon, A.V. Kashaba, A.Y. |
|
| Subject |
Low temperature plasma and plasma technologies
|
|
| Description |
A surface wave plasma source for the production of a large-diameter, high electron density and low electron temperature plasma at low pressure without using a magnetic field for plasma processing and thin film preparation are. The DC or RF voltage with the frequency of 13.56 MHz can supply the source. The pumping-out of the source is carried out through the insulated substrate holder. The plasma source operates in a working gas pressure range of 3∙10⁻² ÷ 10⁻⁴ Torr with changing the RF power in a range of 50÷1000 W during the discharge on surface waves with the mode 0 excited by a ring antenna. The plasma density has a homogeneous distribution over a diameter of 300 mm and varies in a range of 10⁸÷10¹⁰ cm⁻³ at electron temperature of 2÷7 eV depending on external parameters. An ion beam density in the presence of the RF bias applied to the substrate holder reached 0.1 mA/сm² with homogeneous distribution over the diameter of 300 mm. The total ion current to the substrate holder with a diameter of 467 mm reaches the value of 2 A with average ion energy of 200 eV. Numerical analysis of electric field distribution over the processing chamber in linear approach was made and compared to experimental results obtained.
|
|
| Date |
2015-03-30T09:37:26Z
2015-03-30T09:37:26Z 2002 |
|
| Type |
Article
|
|
| Identifier |
Large-area surface wave plasma source / N.A. Azarenkov, A.A. Bizyukov, A.V. Gapon, A.Y. Kashaba, K.N. Sereda, A.Ph. Tseluyko, N.N. Yunakov // Вопросы атомной науки и техники. — 2002. — № 5. — С. 118-120. — Бібліогр.: 6 назв. — англ.
1562-6016 PACS: 52.50.Dg http://dspace.nbuv.gov.ua/handle/123456789/79286 |
|
| Language |
en
|
|
| Relation |
Вопросы атомной науки и техники
|
|
| Publisher |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
|
|