Electron sources for plasma electronics and different technological application
Vernadsky National Library of Ukraine
Переглянути архів ІнформаціяПоле | Співвідношення | |
Title |
Electron sources for plasma electronics and different technological application
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Creator |
Antipov, V.S.
Bez’yazyshny, I.A. Berezhnaya, I.V. Kornilov, E.A. |
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Subject |
Plasma electronics
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Description |
There are the following advantages of applying electron guns with plasma cathodes in devices exciting microwave radiation: stability of their parameters, high density of current, relative insensitivity to ion bombardment and the possibility of operating over a wide range of pressure values of a plasma-generating gas [1-5]. The given work aims at constructing the guns with the parameters necessary for the excitation of microwaves of high amplitudes in the slow-wave structures: the beam energy is 20-30 kV, the current is up to 5 A, and the pulse duration is 0,11÷1 ms. The principal problem arising during construction of heavy-current electron sources with plasma emitters consists in the following: it is necessary to provide such conditions of the gas volume, under which the discharge firing would be stable and the emissive plasma generation be effective, whereas a gas breakdown in the accelerating gap must be eliminated.
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Date |
2015-04-14T17:38:24Z
2015-04-14T17:38:24Z 2002 |
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Type |
Article
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Identifier |
Electron sources for plasma electronics and different technological application / V.S. Antipov, I.A. Bez’yazyshny, I.V. Berezhnaya, E.A. Kornilov // Вопросы атомной науки и техники. — 2002. — № 4. — С. 155-157. — Бібліогр.: 4 назв. — англ.
1562-6016 PACS: 52.80.-s; 52.77.-j http://dspace.nbuv.gov.ua/handle/123456789/80310 |
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Language |
en
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Relation |
Вопросы атомной науки и техники
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Publisher |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
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