Application of focused charge‐particle beams of in manufacturing of nanocomponents
Electronic Archive of Sumy State University
Переглянути архів Інформація| Поле | Співвідношення | |
| Title |
Application of focused charge‐particle beams of in manufacturing of nanocomponents
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| Creator |
Vorobiov, Hennadii Saveliiovych
Воробьев, Геннадий Савельевич Воробйов, Геннадій Савелійович Ponomarev, А.G. Ponomareva, А.А. Drozdenko, Oleksii Oleksandrovych Дрозденко, Алексей Александрович Дрозденко, Олексій Олександрович Rybalko, А.А. |
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| Subject |
manufacturing
focused beam nanoelectronics beam litography |
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| Description |
Application of focused beams of medium energy light ions, electrons and low energy heavy ions is considered for the technology of manufacturing of small-dimension components. Physical principles applied as the basis for interaction of the above beams with resistive materials are described. The proton beam lithography is considered as a new technology possessing high potential capabilities for various applications like micro-optics and nanoelectronics of terahertz wave band.
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| Publisher |
Telecommunications and Radio Engineering
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| Date |
2011-03-18T06:53:07Z
2011-03-18T06:53:07Z 2010 |
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| Type |
Article
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| Identifier |
Application of focused charge-particle beams of in manufacturing of nanocomponents[Текст] /G.S.Vorobyov, А.G.Ponomarev, А.А.Ponomareva [та ін.] // Telecommunications and Radio Engineering. — 2010. — №69(4). — pp. 355-365
0040-2508 http://essuir.sumdu.edu.ua/handle/123456789/3912 |
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| Language |
en
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