Запис Детальніше

The influence of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers

Цифровой репозитарии Национального технического университета "Харьковский политехнический институт" (eNTUKhPIIR)

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Поле Співвідношення
 
Title The influence of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers
 
Creator Pershyn, Y. P.
Gullikson, E. M.
Artyukov, I. A.
Kondratenko, V. V.
Sevryukova, V. A.
Voronov, D. L.
Zubarev, E. N.
Vinogradov, A. V.
 
Subject multilayer X-ray mirror
interlayer composition
Ar pressure variation
magnetron sputtering
 
Description Impact of Ar gas pressure (1−4 mTorr) on the growth of amorphous interlayers in Mo/Si multilayers deposited by magnetron sputtering was investigated by small-angle x-ray scattering (l=0.154 nm) and methods of cross-sectional transmission electron microscopy. Some reduction of thickness of the amorphous inter-layers with Ar pressure increase was found, while composition of the layers was enriched with molybdenum. The interface modification resulted in raise of EUV reflectance of the Mo/Si multilayers
 
Date 2014-03-12T20:34:25Z
2014-03-12T20:34:25Z
2011
 
Type Article
 
Identifier The influence of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers / Y. P. Pershyn [et al.] // SPIE. – 2011. – Vol. 8139m. – p. 0N1-0N11.
http://repository.kpi.kharkov.ua/handle/KhPI-Press/4716
 
Language en
 
Publisher American Institute of Physics