The influence of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers
Цифровой репозитарии Национального технического университета "Харьковский политехнический институт" (eNTUKhPIIR)
Переглянути архів ІнформаціяПоле | Співвідношення | |
Title |
The influence of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers
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Creator |
Pershyn, Y. P.
Gullikson, E. M. Artyukov, I. A. Kondratenko, V. V. Sevryukova, V. A. Voronov, D. L. Zubarev, E. N. Vinogradov, A. V. |
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Subject |
multilayer X-ray mirror
interlayer composition Ar pressure variation magnetron sputtering |
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Description |
Impact of Ar gas pressure (1−4 mTorr) on the growth of amorphous interlayers in Mo/Si multilayers deposited by magnetron sputtering was investigated by small-angle x-ray scattering (l=0.154 nm) and methods of cross-sectional transmission electron microscopy. Some reduction of thickness of the amorphous inter-layers with Ar pressure increase was found, while composition of the layers was enriched with molybdenum. The interface modification resulted in raise of EUV reflectance of the Mo/Si multilayers
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Date |
2014-03-12T20:34:25Z
2014-03-12T20:34:25Z 2011 |
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Type |
Article
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Identifier |
The influence of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers / Y. P. Pershyn [et al.] // SPIE. – 2011. – Vol. 8139m. – p. 0N1-0N11.
http://repository.kpi.kharkov.ua/handle/KhPI-Press/4716 |
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Language |
en
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Publisher |
American Institute of Physics
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