Electron attachment to atomic hydrogen on the surface of liquid ⁴He
Vernadsky National Library of Ukraine
Переглянути архів ІнформаціяПоле | Співвідношення | |
Title |
Electron attachment to atomic hydrogen on the surface of liquid ⁴He
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Creator |
Arai, T.
Yayama, H. Kono, K. |
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Subject |
Электроны над жидким гелием
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Description |
We demonstrate a possibility that helium surface electrons at cryogenic temperatures can be used as a new source of very low energy electrons. Since both electrons (e¯) and hydrogen atoms (H) are bound on liquid helium surface, two-dimensional mixture gas of these two species is available on the surface. We found that low energy collision of e¯ and H drives electron attachment to form a negative hydrogen ion (H¯) in the mixture. From our temperature dependence measurement of the reaction rate, it was found that another H atom participate in the reaction. Namely, the reaction is expressed as H + H + e¯ → H¯ + H. Possible reaction mechanisms are discussed in terms of direct three-body process and dissociative attachment process. Measurements in applied magnetic field (B) show that the reaction rate coefficient is suppressed as ~ B⁻². This implies that electron spin singlet collision is relevant for electron attachment. |
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Date |
2017-05-18T11:14:15Z
2017-05-18T11:14:15Z 2008 |
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Type |
Article
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Identifier |
Electron attachment to atomic hydrogen on the surface
of liquid ⁴He / T. Arai, H. Yayama, K. Kono // Физика низких температур. — 2008. — Т. 34, № 4-5. — С. 496–503. — Бібліогр.: 28 назв. — англ.
0132-6414 PACS: 67.63.Gh;67.25.–k;68.03–g http://dspace.nbuv.gov.ua/handle/123456789/116927 |
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Language |
en
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Relation |
Физика низких температур
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Publisher |
Фізико-технічний інститут низьких температур ім. Б.І. Вєркіна НАН України
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