Optical properties of ion implanted thin Ni films on lithium niobate
Vernadsky National Library of Ukraine
Переглянути архів ІнформаціяПоле | Співвідношення | |
Title |
Optical properties of ion implanted thin Ni films on lithium niobate
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Creator |
Lysiuk, V.O.
Staschuk, V.S. Androsyuk, I.G. Moskalenko, N.L. |
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Description |
Ion implantation by keV Ar⁺ ions creates blisters on the surface of thin Ni films deposited on lithium niobate and causes changes in optical properties and structure of Ni film and lithium niobate substrate. Processes of ion implantation and effects of increasing absorption, adhesion, damage threshold are described and explained in the paper. Development of pyroelectric photodetector “thin Ni film – lithium niobate” is proposed.
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Date |
2017-05-25T17:27:08Z
2017-05-25T17:27:08Z 2011 |
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Type |
Article
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Identifier |
Optical properties of ion implanted thin Ni films on lithium niobate / V.O. Lysiuk, V.S. Staschuk, I.G. Androsyuk, N.L. Moskalenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 1. — С. 59-61. — Бібліогр.: 9 назв. — англ.
1560-8034 PACS 68.Ln, 78.20.-e, 85.60.Gz http://dspace.nbuv.gov.ua/handle/123456789/117623 |
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Language |
en
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Relation |
Semiconductor Physics Quantum Electronics & Optoelectronics
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Publisher |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
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