Запис Детальніше

Formation of blisters in thin metal films on lithium niobate implanted by keV Ar⁺ ions

Vernadsky National Library of Ukraine

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Title Formation of blisters in thin metal films on lithium niobate implanted by keV Ar⁺ ions
 
Creator Lysiuk, V.O.
Moskalenko, N.L.
Staschuk, V.S.
Kluy, M.I.
Vakulenko, O.V.
Androsyuk, I.G.
Surmach, M.A.
Pogoda, V.I.
 
Description Bubble-like and crater-like blisters were observed at the boundaries of the
structures “thin Ni film–lithium niobate” and “thin Pd film–lithium tantalate” implanted
by Ar⁺
ions. Analyses of these systems by AFM and SEM have shown that ion
implantation essentially modifies near-surface structures with changing their optical,
electrical and mechanical properties. Differences in the optical properties and surface
structure between implanted and non-implanted systems are observed and explained by
different properties of materials, widening interface “film–substrate” as well as by other
known effects and phenomena. Enhanced adhesion of these films to substrate,
nonselective spectral response is a base for effective and perspective application of the
systems in development of high-sensitive pyroelectric detectors with a wide spectral
range and high optical damage threshold.
 
Date 2017-05-26T19:03:21Z
2017-05-26T19:03:21Z
2010
 
Type Article
 
Identifier Formation of blisters in thin metal films on lithium niobate implanted by keV Ar⁺ ions / V.O. Lysiuk, N.L. Moskalenko, V.S. Staschuk, M.I. Kluy, O.V. Vakulenko, I.G. Androsyuk, M.A. Surmach, V.I. Pogoda // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2010. — Т. 13, № 1. — С. 103-109. — Бібліогр.: 10 назв. — англ.
1560-8034
PACS 68.55.Ln, 85.60.Gz
http://dspace.nbuv.gov.ua/handle/123456789/117822
 
Language en
 
Relation Semiconductor Physics Quantum Electronics & Optoelectronics
 
Publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України