Запис Детальніше

Charge characteristics of the MOS structures with oxide films containing Si nanocrystals

Vernadsky National Library of Ukraine

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Title Charge characteristics of the MOS structures with oxide films containing Si nanocrystals
 
Creator Begun, E.V.
Bratus’, O.L.
Evtukh, A.A.
Kaganovich, E.B.
Manoilov, E.G.
 
Description The processes of charge accumulation in the MOS structures with SiO₂ films
containing Si nanocrystals are investigated, depending on the conditions of their
formation by pulsed laser deposition. High-frequency capacity-voltage characteristics of
structures with the different thicknesses of films, sizes of Si nanocrystals, and their
densities in the case of doping the films with gold and without it are measured. It is
shown that the positive and negative charges are built-in, respectively, in the undoped
films and those doped with gold. At the record of C-V curves, the accumulation of a
positive charge is observed. The value of accumulated charge is higher in thin films and
in the films doped with gold. The obtained results testify the possibility of the use of
pulsed laser deposition for creation of memory structures based on the charge capture by
Si nanocrystals.
 
Date 2017-05-27T11:06:56Z
2017-05-27T11:06:56Z
2007
 
Type Article
 
Identifier Charge characteristics of the MOS structures with oxide films containing Si nanocrystals / Е.V. Begun, O.L. Bratus', A.A. Evtukh, E.B. Kaganovich, E.G. Manoilov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 2. — С. 46-50. — Бібліогр.: 10 назв. — англ.
1560-8034
PACS 61.72.Tt, 84.37.+q, 85.35.Be
http://dspace.nbuv.gov.ua/handle/123456789/117892
 
Language en
 
Relation Semiconductor Physics Quantum Electronics & Optoelectronics
 
Publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України