Influence of ion implantation on the near-surface structure of thin Ni and Pd films on lithium niobate and lithium tantalate
Vernadsky National Library of Ukraine
Переглянути архів Інформація| Поле | Співвідношення | |
| Title |
Influence of ion implantation on the near-surface structure of thin Ni and Pd films on lithium niobate and lithium tantalate
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| Creator |
Lysiuk, V.O.
Staschuk, V.S. Kluy, M.I. Vakulenko, O.V. Poperenko, L.V. |
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| Description |
The systems “thin Ni film – lithium niobate” and “thin Pd film – lithium tantalate” are implanted by Ar⁺ ions with an energy of 100 keV and a dose of 10¹⁶ cm⁻². Analyses of the systems by AFM and SEM have shown that the ion implantation essentially modifies the near-surface structure resulting in a change of its optical, electrical, and mechanical properties. Strong difference in the near-surface structures between implanted systems with Ni or Pd thin films is observed. Such a difference is explained by the heterogeneity of an ion beam and different properties of the materials. The application to the development of high-sensitive pyroelectric detectors with high damage threshold is proposed. |
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| Date |
2017-05-27T12:22:27Z
2017-05-27T12:22:27Z 2007 |
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| Type |
Article
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| Identifier |
Influence of ion implantation on the near-surface structure of thin Ni and Pd films on lithium niobate and lithium tantalate / V.O. Lysiuk, V.S. Staschuk, M.I. Kluy, O.V. Vakulenko, L.V. Poperenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 2. — С. 76-80. — Бібліогр.: 13 назв. — англ.
1560-8034 PACS 68.55.Ln, 85.60.Gz http://dspace.nbuv.gov.ua/handle/123456789/117919 |
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| Language |
en
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| Relation |
Semiconductor Physics Quantum Electronics & Optoelectronics
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| Publisher |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
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