Vacuum method for creation of liquid crystal orienting microrelief
Vernadsky National Library of Ukraine
Переглянути архів Інформація| Поле | Співвідношення | |
| Title |
Vacuum method for creation of liquid crystal orienting microrelief
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| Creator |
Kolomzarov, Yu.
Oleksenko, P. Sorokin, V. Tytarenko, P. Zelinskyy, R. |
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| Description |
A mechanism for creation of microrelief surface anisotropy of amorphous films oxides materials which are obtained by oblique reactive cathode sputtering method is described. The influence of technological parameters of sputtering on the LC orienting parameters is investigated. The dependencies of the target material, angle of material emission and reemission processes under the substrate negative ion treatment is shown. The application of oblique reactive cathode sputtering method for creation of LCD with differ-ent size is demonstrated.
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| Date |
2017-05-28T17:10:54Z
2017-05-28T17:10:54Z 2003 |
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| Type |
Article
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| Identifier |
Vacuum method for creation of liquid crystal orienting microrelief / Yu. Kolomzarov, P. Oleksenko, V. Sorokin, P. Tytarenko, R. Zelinskyy // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2003. — Т. 6, № 4. — С. 528-532. — Бібліогр.: 16 назв. — англ.
1560-8034 PACS: 42.79.Kr http://dspace.nbuv.gov.ua/handle/123456789/118102 |
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| Language |
en
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| Relation |
Semiconductor Physics Quantum Electronics & Optoelectronics
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| Publisher |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
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