Запис Детальніше

Charge transition phenomena in the heterostructure crystalline Si-Bi-amorphous film Ge₃₃As₁₂Se₅₅

Vernadsky National Library of Ukraine

Переглянути архів Інформація
 
 
Поле Співвідношення
 
Title Charge transition phenomena in the heterostructure crystalline Si-Bi-amorphous film Ge₃₃As₁₂Se₅₅
 
Creator Kondrat, O.
Popovich, N.
Dovgoshej, N.
 
Description Ge₃₃As₁₂Se₅₅-Si(n) heterostructures with modified by bismuth atoms transition layer were obtained by the discrete thermal evaporation method. Described are formation and investigation methods for these heterostructures. The mechanism of charge transmission in this heterostructures was ascertained. It is illustrated that the barrier for holes at the boundary is absent. The energy diagram of the heterostructure was built. Analyzed is the absence of a soft breakdown, which is caused by the electrons transfer through interstices when the negative voltage is applied. The dependence of heterostructure electrophysical properties on Ge₃₃As₁₂Se₅₅ film thickness was investigated. It is shown that in heterostructures with a modified transition layer ther is a necessity to use Ge₃₃As₁₂Se₅₅ film with the thickness more than 0.4 mm. It is ascertained that at the modification of the transition layer the conversion from the sharp to smooth transition takes place, which is caused by diffusion of bismuth atoms to surface layers.
 
Date 2017-05-28T17:29:43Z
2017-05-28T17:29:43Z
2004
 
Type Article
 
Identifier Charge transition phenomena in the heterostructure crystalline Si-Bi-amorphous film Ge₃₃As₁₂Se₅₅ / O. Kondrat, N. Popovich, N. Dovgoshej // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2004. — Т. 7, № 1. — С. 56-59. — Бібліогр.: 13 назв. — англ.
1560-8034
PACS: 73.40.-c
http://dspace.nbuv.gov.ua/handle/123456789/118107
 
Language en
 
Relation Semiconductor Physics Quantum Electronics & Optoelectronics
 
Publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України