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Peculiarities of thermoannealing in n-Si and n-Ge crystals with oxygen impurity

Vernadsky National Library of Ukraine

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Title Peculiarities of thermoannealing in n-Si and n-Ge crystals with oxygen impurity
 
Creator Baranskii, P.I.
Gaidar, G.P.
 
Description . Investigated in this work were changes in the concentration of charge carriers
ne and their mobilities u, which occur under the influence of thermoannealing of n - Si
and n - Ge crystals grown by the Czochralski method. Thermoannealing of n - Si
samples was carried out both at 450 °C and 650 °C. The results of the influence of twostage
(combined) thermoannealing have been presented. In the first series of
experiments, the annealing was performed at 450 °C with varied duration (from 5 to
45 h) at the beginning, and then it was carried out for 40 hours at 650 °C. The second
series of experiments was as follows: the annealing at 450 °C for 45-hour duration, then
the annealing at 650 °C, which was carried out for various periods of time
(5, 10, 20, 45, 66 hours). The observations for changes of ne and u were carried out both
at the temperature 300 and 77 K. It is ascertained that changing the main parameters (ne
and u) in n  Ge As heavily doped single crystals, as a result of the series of
thermoannealings (duration 30 min in each case) within the temperature range from 540
to 900 °C, is non-monotonous due to transformation of the thermodonors TD - I into
TD-II .
 
Date 2017-05-29T16:43:47Z
2017-05-29T16:43:47Z
2012
 
Type Article
 
Identifier Peculiarities of thermoannealing in n-Si and n-Ge crystals with oxygen impurity / P.I. Baranskii, G.P. Gaidar // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2012. — Т. 15, № 3. — С. 218-222. — Бібліогр.: 24 назв. — англ.
1560-8034
PACS 61.82.Fk
http://dspace.nbuv.gov.ua/handle/123456789/118307
 
Language en
 
Relation Semiconductor Physics Quantum Electronics & Optoelectronics
 
Publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України