Analysis of methods for high-speed forming the relief microimages on metallic substrates
Vernadsky National Library of Ukraine
Переглянути архів Інформація| Поле | Співвідношення | |
| Title |
Analysis of methods for high-speed forming the relief microimages on metallic substrates
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| Creator |
Kryuchin, A.A.
Pankratova, A.V. Kassko, I.A. Nagorny, F.V. Chirkov, D.V. |
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| Description |
The use of methods of ion and electrochemical etching of metallic substrates to obtain relief microstructures with micron and submicron sizes is considered. Presented are the results of experimental researches of processes aimed at manufacturing metallic carriers by using inorganic photoresists. |
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| Date |
2017-05-29T19:32:28Z
2017-05-29T19:32:28Z 2007 |
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| Type |
Article
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| Identifier |
Analysis of methods for high-speed forming the relief microimages on metallic substrates / A.A. Kryuchin, A.V. Pankratova, I.A. Kassko, F.V.Nagorny, D.V.Chirkov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 4. — С. 87-93. — Бібліогр.: 17 назв. — англ.
1560-8034 PACS 42.40.Ht, 42.79.Vb, 81.65.Cf http://dspace.nbuv.gov.ua/handle/123456789/118339 |
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| Language |
en
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| Relation |
Semiconductor Physics Quantum Electronics & Optoelectronics
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| Publisher |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
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