Mechanical scanning probe nanolithography: modeling and application
Vernadsky National Library of Ukraine
Переглянути архів Інформація| Поле | Співвідношення | |
| Title |
Mechanical scanning probe nanolithography: modeling and application
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| Creator |
Lytvyn, P.M.
Lytvyn, O.S. Dyachyns’ka, O.M. Grytsenko, K.P. Schrader, S. Prokopenko, I.V. |
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| Description |
The paper presents a study on modeling the mechanical interaction between the tip of a scanning atomic force microscope (AFM) and surfaces of various types, which makes it possible to optimize parameters and modes for mechanical AFM nanolithography. The practical assessment of mechanical nanoprobe lithography based on the method of a direct surface patterning was carried out during fabrication of functional elements for molecular electronics. Polymethine dye nanowires of a specified configuration and the cross-section 3×20 nm have been successfully formed in a multilayer polytetrafluoroethylene/gold/silicon nanostructure. |
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| Date |
2017-05-31T05:16:38Z
2017-05-31T05:16:38Z 2012 |
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| Type |
Article
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| Identifier |
Mechanical scanning probe nanolithography:
modeling and application / P.M. Lytvyn, O.S. Lytvyn, O.M. Dyachyns’ka, K.P. Grytsenko, S. Schrader, I.V. Prokopenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2012. — Т. 15, № 4. — С. 321-327. — Бібліогр.: 23 назв. — англ.
1560-8034 PACS 81.16.Nd http://dspace.nbuv.gov.ua/handle/123456789/118721 |
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| Language |
en
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| Relation |
Semiconductor Physics Quantum Electronics & Optoelectronics
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| Publisher |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
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