Perspectives for using technology of laser thermolithography
Vernadsky National Library of Ukraine
Переглянути архів Інформація| Поле | Співвідношення | |
| Title |
Perspectives for using technology of laser thermolithography
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| Creator |
Kryuchyn, A.A.
Lapchuk, A.S. Bryts’kyi, A.I. Kostyukevych, S.O. |
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| Description |
Analyzed in this work are the requirements to an optical system for laser thermolithographic recording. It has been shown that possibilities of this type recording with decreasing the registered element sizes can be realized only when using special measures for stabilizing both exposing radiation power and duration of laser pulses. Using the thermolithographic method for making super-dense patterns also requires creation of a specific system for dynamic focusing with accuracy better than 100 nm. It has been shown that the specific heat of thermochemical reaction and thermal resistance of a substrate are critical parameters for this method. |
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| Date |
2017-05-31T05:17:12Z
2017-05-31T05:17:12Z 2012 |
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| Type |
Article
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| Identifier |
Perspectives for using technology of laser thermolithography / A.A. Kryuchyn, A.S. Lapchuk, A.I. Bryts’kyi, S.O. Kostyukevych // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2012. — Т. 15, № 4. — С. 328-332. — Бібліогр.: 9 назв. — англ.
1560-8034 PACS 81.16.Nd http://dspace.nbuv.gov.ua/handle/123456789/118722 |
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| Language |
en
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| Relation |
Semiconductor Physics Quantum Electronics & Optoelectronics
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| Publisher |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
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