Chemical-mechanical polishing of sapphire by polishing suspension based on aerosil
Vernadsky National Library of Ukraine
Переглянути архів Інформація| Поле | Співвідношення | |
| Title |
Chemical-mechanical polishing of sapphire by polishing suspension based on aerosil
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| Creator |
Vovk, E.A.
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| Subject |
Technology
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| Description |
The conditions for the optimal balance among the degree of agglomeration of aerosil in the polishing suspension, removal rate, and the quality of the polished sapphire surface under chemical-mechanical polishing (CMP) with the polishing suspension contained surfactants at different pH were determined. It was determined that these conditions depend on the crystallographic orientation of the sapphire surface. Surface roughness Ra 0.2-0.4 nm and the optical quality class 20/10-40/20 (USA MIL O 13830) was obtained for orientations (0001), (11-20), and (10-12) by CMP with the polishing suspension contained the surfactant with OH functional groups, and at optimal value of pH for each orientations.
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| Date |
2017-06-06T15:13:45Z
2017-06-06T15:13:45Z 2015 |
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| Type |
Article
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| Identifier |
Chemical-mechanical polishing of sapphire by polishing suspension based on aerosil / E.A.Vovk // Functional Materials. — 2015. — Т. 22, № 2. — С. 252-257. — Бібліогр.: 13 назв. — англ.
1027-5495 DOI: http://dx.doi.org/10.15407/fm22.02.252 http://dspace.nbuv.gov.ua/handle/123456789/119359 |
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| Language |
en
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| Relation |
Functional Materials
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| Publisher |
НТК «Інститут монокристалів» НАН України
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