Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique
Vernadsky National Library of Ukraine
Переглянути архів Інформація| Поле | Співвідношення | |
| Title |
Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique
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| Creator |
Shapovalov, A.P.
Korotash, I.V. Rudenko, E.M. Sizov, F.F. Dubyna, D.S. Osipov, L.S. Polotskiy, D.Yu. Tsybri, Z.F. Korchovyi, A.A. |
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| Description |
Aluminum nitride (AlN) film coatings have been obtained by a new technique of hybrid helikon-arc ion-plasma deposition. Possibility to combine the magnetic-filtered arc plasma deposition technique with a treatment in RF plasma of helicon discharge allowed us to deposit AlN coatings on thermolabile substrates, significantly increasing the deposition rate. A study of spectral properties of AlN films (reflection and transmission spectra within the range 2…25 µm) has been carried out by using the infrared Fourier spectrometer Spectrum BX-II. It has been shown that the btained composite structures (AlN coatings on teflon and mylar substrates) could be used as passive filters in the infrared pectral range.
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| Date |
2017-06-12T18:20:35Z
2017-06-12T18:20:35Z 2015 |
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| Type |
Article
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| Identifier |
Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique / A.P. Shapovalov, I.V. Korotash, E.M. Rudenko, F.F. Sizov, D.S. Dubyna, L.S. Osipov, D.Yu. Polotskiy, Z.F. Tsybrii, A.A. Korchovyi // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2015. — Т. 18, № 1. — С. 117-122. — Бібліогр.: 18 назв. — англ.
1560-8034 DOI: 10.15407/spqeo18.02.117 PACS 52.77.Dq, 73.61.Ey, 73.61.Jc, 78.40.Pg, 78.66.Fd http://dspace.nbuv.gov.ua/handle/123456789/120739 |
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| Language |
en
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| Relation |
Semiconductor Physics Quantum Electronics & Optoelectronics
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| Publisher |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
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