Surface polariton excitation in ZnO films deposited using ALD
Vernadsky National Library of Ukraine
Переглянути архів Інформація| Поле | Співвідношення | |
| Title |
Surface polariton excitation in ZnO films deposited using ALD
|
|
| Creator |
Venger, E.F.
Melnichuk, L.Yu. Melnichuk, A.V. Semikina, T.V. |
|
| Description |
The conductive ZnO films deposited using atomic layer deposition (ALD) on the optical glass substrates were studied using the modified method of the disturbed total internal reflection within the range 400…1400 cm⁻¹ for the first time. The frequency “windows” with the obtained excited surface phonon and plasmon-phonon polaritons have been found in the measured infrared reflectance spectra. The dispersion response of high and low frequency branches of the IR spectra have been presented.
|
|
| Date |
2017-06-13T18:28:05Z
2017-06-13T18:28:05Z 2015 |
|
| Type |
Article
|
|
| Identifier |
Surface polariton excitation in ZnO films deposited using ALD / E.F. Venger, L.Yu. Melnichuk, A.V. Melnichuk, T.V. Semikina // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2015. — Т. 18, № 4. — С. 422-427. — Бібліогр.: 15 назв. — англ.
1560-8034 DOI: 10.15407/spqeo18.04.422 PACS 71.36.+c, 73.20.20.Mf http://dspace.nbuv.gov.ua/handle/123456789/121268 |
|
| Language |
en
|
|
| Relation |
Semiconductor Physics Quantum Electronics & Optoelectronics
|
|
| Publisher |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
|
|