Запис Детальніше

New technological possibilities to prepare InP epitaxial layers, as well as ohmic and barrier contacts to them, and the properties of microwave diodes made on their basis

Vernadsky National Library of Ukraine

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Поле Співвідношення
 
Title New technological possibilities to prepare InP epitaxial layers, as well as ohmic and barrier contacts to them, and the properties of microwave diodes made on their basis
 
Creator Arsentyev, I.N.
Bobyl, A.V.
Tarasov, I.S.
Shishkov, M.V.
Boltovets, N.S.
Ivanov, V.N.
Kamalov, A.B.
Konakova, R.V.
Kudryk, Ya.Ya.
Lytvyn, O.S.
Lytvyn, P.M.
Markovskiy, E.P.
Milenin, V.V.
 
Description A novel technological approach to fabrication of n-InP autoepitaxial films LPE-grown on porous n⁺-InP substrates, as well as ohmic and barrier contacts to them using (quasi)amorphous TiBx interstitial phases, is proposed. We demonstrate the advantages of TiBx−n-n⁺-n⁺⁺-InP Schottky-barrier diodes made on porous substrates over those made on the standard rigid substrates, as well as the possibility to make Gunn diodes (intended for the 120−150 GHz frequency range) on the InP epitaxial structures grown on porous substrates.
 
Date 2017-06-14T16:57:19Z
2017-06-14T16:57:19Z
2005
 
Type Article
 
Identifier New technological possibilities to prepare InP epitaxial layers, as well as ohmic and barrier contacts to them, and the properties of microwave diodes made on their basis / I.N. Arsentyev, A.V. Bobyl, I.S. Tarasov, M.V. Shishkov, N.S. Boltovets, V.N. Ivanov, A.E. Belyaev, A.B. Kamalov, R.V. Konakova, Ya.Ya. Kudryk, O.S. Lytvyn, P.M. Lytvyn, E.P. Markovskiy, V.V. Milenin // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2005. — Т. 8, № 4. — С. 105-114. — Бібліогр.: 29 назв. — англ.
1560-8034
PACS 81.05.Rm
http://dspace.nbuv.gov.ua/handle/123456789/121574
 
Language en
 
Relation Semiconductor Physics Quantum Electronics & Optoelectronics
 
Publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України