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Solid state doping of CdxHg₁₋xTe epitaxial layers with elements of V group

Vernadsky National Library of Ukraine

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Title Solid state doping of CdxHg₁₋xTe epitaxial layers with elements of V group
 
Creator Vlasov, A.P.
Bonchyk, A.Yu.
Fodchuk, I.M.
Barcz, A.
Swiatek, Z.T.
Zaplitnyy, R.A.
 
Description Presented here are the results of studying the controlled doping with elements of V group of the periodic table, arsenic As and antimony Sb, of narrow gap CdxHg₁₋xTe epitaxial layers during the isothermal growth from the vapour phase by the evaporation-condensation-diffusion method. Three types of impurity sources have been used for solid state doping: homogeneously doped with As(Sb) single crystal substrates of CdTe, As doped buffer CdyHg₁₋yTe (y > x) epitaxial layers obtained by RF sputtering in mercury glow discharge onto undoped CdTe substrates, and As(Sb) implanted undoped CdTe substrates. The results of comparative analysis of galvano-magnetic measurements and SIMS spectra indicated very high, practically nearly ~100 %, electrical activity of dopants in the CdxHg₁₋xTe epitaxially grown layers.
 
Date 2017-06-14T17:24:50Z
2017-06-14T17:24:50Z
2006
 
Type Article
 
Identifier Solid state doping of CdxHg₁₋xTe epitaxial layers with elements of V group / A.P. Vlasov, A.Yu. Bonchyk, I.M. Fodchuk, R.A. Zaplitnyy, A. Barcz, Z.T. Swiatek // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2006. — Т. 9, № 1. — С. 36-42. — Бібліогр.: 15 назв. — англ.
1560-8034
PACS 61.72.V; 72.80.E
http://dspace.nbuv.gov.ua/handle/123456789/121591
 
Language en
 
Relation Semiconductor Physics Quantum Electronics & Optoelectronics
 
Publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України