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Lowering the density of dislocations in heteroepitaxial III-nitride layers: Effect of sapphire substrate treatment (review)

Vernadsky National Library of Ukraine

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Title Lowering the density of dislocations in heteroepitaxial III-nitride layers: Effect of sapphire substrate treatment (review)
 
Creator Parphenyuk, P.V.
Evtukh, A.A.
 
Description In this paper, different methods for lowering the dislocation density such as incorporation of the buffer layers, substrate patterning and nitridation, silan-ammonia treatment are reviewed and compared. Advantages and limitations of these methods as well as a specific mechanism to reduce the dislocation amount are discussed. Usually, high densities of threading dislocations within the range 10¹⁰…10¹¹ cm⁻² are present in typical thin nitride films that are directly grown on sapphire substrate. Using these methods for substrate preparation, the density of dislocations can be reduced to the value 1·10⁷ cm⁻². An important process that enables to obtain the high-quality GaN layers with the low dislocation density is patterning the sapphire substrate. The dislocation density of these substrates depends on the pattern shape and orientation of patterned strips on cplane sapphire. Layers of GaN grown on a cone-shaped pattern have the lowest dislocation density. In addition, patterning the sapphire substrate increases the external quantum efficiency of radiative structures and reduces the mechanical stresses in the nitride layers.
 
Date 2017-06-14T15:10:29Z
2017-06-14T15:10:29Z
2016
 
Type Article
 
Identifier Lowering the density of dislocations in heteroepitaxial III-nitride layers: Effect of sapphire substrate treatment (review) / P.V. Parphenyuk, A.A. Evtukh // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2016. — Т. 19, № 1. — С. 1-8. — Бібліогр.: 78 назв. — англ.
1560-8034
DOI: 10.15407/spqeo19.01.001
PACS 61.72, 81.15
http://dspace.nbuv.gov.ua/handle/123456789/121516
 
Language en
 
Relation Semiconductor Physics Quantum Electronics & Optoelectronics
 
Publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України