Запис Детальніше

Layer structure formation in Hg₁₋xCdxTe films after high-frequency sonication

Vernadsky National Library of Ukraine

Переглянути архів Інформація
 
 
Поле Співвідношення
 
Title Layer structure formation in Hg₁₋xCdxTe films after high-frequency sonication
 
Creator Savkina, R.K.
Sizov, F.F.
Smirnov, A.B.
Tetyorkin, V.V.
 
Description Electrophysical parameters of Hg₁₋xCdxTe thin films grown by liquid-phase epitaxy and molecular-beam epitaxy were investigated before and after the high-frequency sonication ( fUS = 7.5 MHz, WUS ~ 10⁴ W/m²). It was determined that parameters of MBE-grown Hg₁₋xCdxTe thin films are stable to ultrasound effect, while for thin films grown by LPE the sonically stimulated change of the conductivity type was observed. The best agreement between experiment and calculation was obtained in the frame of the assumption about forming of the thin layer with another conductivity type. The possible nature of the observed effect was analyzed.
 
Date 2017-06-15T03:27:30Z
2017-06-15T03:27:30Z
2006
 
Type Article
 
Identifier Layer structure formation in Hg₁₋xCdxTe films after high-frequency sonication / R.K. Savkina, F.F. Sizov, A.B. Smirnov, V.V. Tetyorkin // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2006. — Т. 9, № 4. — С. 31-35. — Бібліогр.: 20 назв. — англ.
1560-8034
PACS 43.35.+d, 73.61.Ga, 73.50.Jt
http://dspace.nbuv.gov.ua/handle/123456789/121630
 
Language en
 
Relation Semiconductor Physics Quantum Electronics & Optoelectronics
 
Publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України