Structure of TiAlN Reactive Sputtered Coatings
Electronic Archive of Sumy State University
Переглянути архів Інформація| Поле | Співвідношення | |
| Title |
Structure of TiAlN Reactive Sputtered Coatings
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| Creator |
Denisov, V.N.
Mavrin, B.N. Vinogradov, E.A. Polyakov, S.N. Kirichenko, A.N. Gogolinsky, K.V. Useinov, A.S. Blank, V.D. Godinho, V. Philippon, D. Fernandez, A. |
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| Subject |
Coating
Hardness Reactive Sputtering TiAlN |
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| Description |
The Raman spectra, X-ray diffraction and hardness of the TiAlN films co-deposited on the steel substrates by reactive sputtering from Ti and Al targets in a mixture of N2 + Ar gas with two magnetrons at room temperature have been studied. From Raman spectra it is found that the position of high-frequency bands in vibrational spectra was located at 700-730 cm 1 or in the region of 830 850 cm 1 depending on the deposition parameters whereas it is not exceed 630 cm 1 from TiAlN of NaCl structure. It is found the two-phase structure of coatings: a small quantity of NaCl-type structure of TiAlN (TiN) and the disordered structure of the chains of polyhedra [TiNx] with x = 5 and x = 4. The chains of polyhedra [TiNx] with x = 4 are mainly formed at large discharge power of Al(Ti) target or at small content of N2 gas. |
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| Publisher |
Видавництво СумДУ
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| Date |
2012-03-29T07:09:45Z
2012-03-29T07:09:45Z 2012 |
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| Type |
Article
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| Identifier |
V.N. Denisov, B.N. Mavrin, E.A. Vinogradov, et al. J. Nano-Electron. Phys. 4 No 1, 01021 (2012)
http://essuir.sumdu.edu.ua/handle/123456789/24922 |
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| Language |
en
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