Degradation of phenolic compounds in water by non-thermal plasma treatment
Vernadsky National Library of Ukraine
Переглянути архів Інформація| Поле | Співвідношення | |
| Title |
Degradation of phenolic compounds in water by non-thermal plasma treatment
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| Creator |
Hsu-Hui Cheng
Shiao-Shing Chen Kazuharu Yoshizuka Yung-Chih Chen |
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| Subject |
Физическая химия процессов обработки воды
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| Description |
A stainless-steel hollow needle type anode was used in the reactor to treat industrial wastewater by gas-liquid phase non-thermal plasma by corona discharge. The results showed that the short electrode gap, 1 cm, has a higher plasma energy density which improves the removal of the phenolic derivatives, reaching 100% after about 60 min. The H₂O₂ concentration was higher in the discharge system when the content of oxygen was increased. The efficiency of the phenol removal by chemical oxygen demand was only 10 – 31% after 60 minutes. The identifie dinterme diates were catechol, hydroquinone,1,4-benzoquinone, 2-nitrophenol,1,2-benzenedicarboxylic acid, diphenylmethanone, 2-methyl-hydroquinone, 2-methyl-1,4-bezoquinone, and trace amounts of organic.
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| Date |
2018-02-19T20:33:47Z
2018-02-19T20:33:47Z 2012 |
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| Type |
Article
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| Identifier |
Degradation of phenolic compounds in water by non-thermal plasma treatment / Hsu-Hui Cheng, Shiao-Shing Chen, Kazuharu Yoshizuka, Yung-Chih Chen // Химия и технология воды. — 2012. — Т. 34, № 4. — С. 304-319. — Бібліогр.: 24 назв. — англ.
0204-3556 http://dspace.nbuv.gov.ua/handle/123456789/130717 |
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| Language |
en
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| Relation |
Химия и технология воды
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| Publisher |
Інститут колоїдної хімії та хімії води ім. А.В. Думанського НАН України
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