Electrodeposition of copper indium diselenide films using pulse plating technique
Vernadsky National Library of Ukraine
Переглянути архів ІнформаціяПоле | Співвідношення | |
Title |
Electrodeposition of copper indium diselenide films using pulse plating technique
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Creator |
Klochko, N.P.
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Description |
Parameters of rectangular potential pulse electolysis wich have provided the obtaining of nearly stoichiometric copper indium diselenide layers have been selected using the examination of those films by energy-dispersive X-ray spectroscopy, anodic stripping, scanning electron microscopy and the film resistivity measurements.
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Date |
2018-06-16T18:25:38Z
2018-06-16T18:25:38Z 2007 |
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Type |
Article
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Identifier |
Electrodeposition of copper indium diselenide films using pulse plating technique / N.P. Klochko // Functional Materials. — 2007. — Т. 14, № 3. — С. 343-346. — Бібліогр.: 9 назв. — англ.
1027-5495 http://dspace.nbuv.gov.ua/handle/123456789/136990 |
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Language |
en
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Relation |
Functional Materials
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Publisher |
НТК «Інститут монокристалів» НАН України
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