Запис Детальніше

Chemical polishing of InAs, InSb, GaAs and GaSb

Vernadsky National Library of Ukraine

Переглянути архів Інформація
 
 
Поле Співвідношення
 
Title Chemical polishing of InAs, InSb, GaAs and GaSb
 
Creator Levchenko, I.V.
Tomashyk, V.M.
Stratiychuk, I.B.
Malanych, G.P.
Stanetska, A.S.
Korchovyi, A.A.
 
Subject Technology
 
Description The mechanism and kinetics of chemical dissolution of InAs, InSb, GaAs and GaSb in (NH₄)₂Cr₂O₇-HBr-C₄H₆O₆ etching mixtures have been studied. Influence of tartaric acid on the parameters of chemical-dynamic polishing and morphology of the obtained crystals surface has been determined. Using of (NH₄)₂Cr₂O₇-HBr-C₄H₆O₆ etching solutions provides the controlled removal of thin layers and the polishing of investigated semiconductors. The polishing etchant compositions have been proposed and conditions for the chemical-dynamic polishing of the InAs, InSb, GaAs and GaSb crystals have been optimized.
 
Date 2018-06-16T17:23:19Z
2018-06-16T17:23:19Z
2017
 
Type Article
 
Identifier Chemical polishing of InAs, InSb, GaAs and GaSb / I.V. Levchenko, V.M. Tomashyk, I.B. Stratiychuk, G.P. Malanych, A.S. Stanetska, A.A. Korchovyi // Functional Materials. — 2017. — Т. 24, № 4. — С. 654-659. — Бібліогр.: 12 назв. — англ.
1027-5495
DOI: https://doi.org/10.15407/fm24.04.654
http://dspace.nbuv.gov.ua/handle/123456789/136890
 
Language en
 
Relation Functional Materials
 
Publisher НТК «Інститут монокристалів» НАН України