Structure of tantalum diboride thin films deposited by RF-magnetron sputtering
Vernadsky National Library of Ukraine
Переглянути архів Інформація| Поле | Співвідношення | |
| Title |
Structure of tantalum diboride thin films deposited by RF-magnetron sputtering
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| Creator |
Konovalov, V.A.
Terpiy, D.N. Klyahina, N.A. Kostenko, I.G. Vasetskaya, L.A. |
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| Subject |
Technology
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| Description |
The tantalum diboride films have been deposited in various conditions by non-reactive RF magnetron sputtering. The film phase compositions and structures have been determined by X-ray diffraction, secondary ion mass spectrometry, and electron microscopy. The effect of the substrate temperature and of positive bias potential value on the texturing extent and phase composition has been defined. Some general regularities of the film growth have been established: the formation of quasi-amorphous structure and its transition to textured condensate with various texturing extent.
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| Date |
2018-06-17T09:17:07Z
2018-06-17T09:17:07Z 2008 |
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| Type |
Article
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| Identifier |
Structure of tantalum diboride thin films deposited by RF-magnetron sputtering / V.A. Konovalov, D.N. Terpiy, N.A. Klyahina, I.G. Kostenko, L.A. Vasetskaya // Functional Materials. — 2008. — Т. 15, № 1. — С. 144-148. — Бібліогр.: 12 назв. — англ.
1027-5495 http://dspace.nbuv.gov.ua/handle/123456789/137237 |
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| Language |
en
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| Relation |
Functional Materials
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| Publisher |
НТК «Інститут монокристалів» НАН України
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