Optimized measurements of planarity of the nanostructure surfaces
Electronic Archive of Sumy State University
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| Title |
Optimized measurements of planarity of the nanostructure surfaces
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| Creator |
Holovchenko, A.I.
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| Description |
In micro- nanofabrication planarity of the surfaces is the key of successful process flow. Defects, caused by processes such as etching, inhomogeneity caused either deposition or sputtering can be detected via special metrology techniques and tools. Detection can be done in two ways: by a digital image comparison technique or by laser scanning technology. Noticeable, that both techniques are used in industry and science. Laser scattering tool mostly destined for blank monitor wafers, as image comparison is for patterned wafers. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/27596 Supervisor: T.J. Kippenberg |
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| Publisher |
Видавництво СумДУ
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| Date |
2012-08-10T06:01:20Z
2012-08-10T06:01:20Z 2012 |
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| Type |
Article
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| Identifier |
Holovchenko, A.I.
Optimized measurements of planarity of the nanostructure surfaces [Текст] / A.I. Holovchenko ; Supervisor T.J. Kippenberg
// Фізика, електроніка, електротехніка : матеріали та програма науково-технічної конференції, м. Суми, 16-21 квітня 2012 р. / Відп. за вип. С.І. Проценко. - Суми : СумДУ, 2012. - C. 61.
http://essuir.sumdu.edu.ua/handle/123456789/27596 |
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| Language |
en
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