Fabrication of Low-Roughness Au/Ti/ SiO2/Si Substrates for Nanopatterning of 16-Mercapto Hexadecanoic Acid (MHA) by Dip-Pen-Nanolithography
Electronic Archive of Sumy State University
Переглянути архів Інформація| Поле | Співвідношення | |
| Title |
Fabrication of Low-Roughness Au/Ti/ SiO2/Si Substrates for Nanopatterning of 16-Mercapto Hexadecanoic Acid (MHA) by Dip-Pen-Nanolithography
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| Creator |
Kumar, A.
Agarwal, P.B. Gupta, S.K. Sharma, A.K. Kumar, D. Chandra, Shekhar |
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| Subject |
Atomic force microscopy
Dip-pen-nanolithography Nanopatterning Self-assembled-monolayers |
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| Description |
Silicon based low-roughness Au/Ti/SiO2/Si substrates were fabricated using standard IC fabrication processes. Evolution of surface roughness during substrate fabrication process was studied. Fabrication process steps, namely, thermal oxidation and e-beam evaporation for ultra-thin Ti(~ 5 nm)/Au(22 nm) films, were optimized to result in surface r.m.s roughness ~ 0.2 m and ~ 1.0 nm, after thermal oxidation and Ti/Au deposition steps respectively. Surface roughness was estimated by atomic force microscope (AFM) imaging and image analysis. Nano-patterning experiments using thiol based 16-MHA molecular-ink on fabricated substrates were carried out, under controlled environment conditions, by dip-pen-nanolithography (DPN) technique. Minimum line-width ~ 60 nm and circular dots radius ~ 175 nm were patterned. |
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| Publisher |
Сумський державний університет
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| Date |
2012-08-28T08:29:09Z
2012-08-28T08:29:09Z 2012 |
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| Type |
Article
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| Identifier |
A. Kumar, P.B. Agarwal, S.K. Gupta, et al., J. Nano-Electron. Phys. 4 No 2, 22 (2012)
http://essuir.sumdu.edu.ua/handle/123456789/27794 |
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| Language |
en
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