Mathematical study of the effects of applied stress, T-stress and back stress in photoelastic fringe patterns
DSpace at Ternopil State Ivan Puluj Technical University
Переглянути архів Інформація| Поле | Співвідношення | |
| Title |
Mathematical study of the effects of applied stress, T-stress and back stress in photoelastic fringe patterns
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| Creator |
Tee, K. F.
Christopher, C. J. James, M. N. Patterson, E. A. |
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| Contributor |
Faculty of Technology, University of Plymouth, Plymouth, Devon, PL4 8AA, United Kingdom
Department of Mechanical Engineering, Michigan State University, 555 Engineering Building, East Lansing, Michigan 48864-1226, USA |
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| Description |
This work is an attempt at developing a novel mathematical model to describe the stresses near the crack tip, taking into consideration the effects of plasticity. The focus is on describing how the applied stress normal to the crack, herein referred to as the K-stress, Tstress and ‘back stress’ induced by plasticity along the crack flank and in the crack tip plastic zone influence the crack tip elastic stress fields. The important features emerging from this study are that the sign and magnitude of each term can substantially alter the crack tip stress fields, and hence influence the photoelastic fringe patterns. To validate the mathematical model, polycarbonate compact tension specimens have been used and observed in a transmission polariscope in order to study the single effect of a pure ‘back stress’ (acting as an interfacial shear stress at the elastic-plastic boundary) and combination effects of K-stress, Tstress and ‘back stress’. It is observed that the fringe patterns obtained through experiment show good agreement with those derived by mathematical modelling. |
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| Date |
2016-06-05T06:57:59Z
2016-06-05T06:57:59Z 2006-09-25 2006-09-25 |
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| Type |
Article
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| Identifier |
Mathematical study of the effects of applied stress, T-stress and back stress in photoelastic fringe patterns / K. F. Tee, C. J. Christopher, M. N. James, E. A. Patterson // Механічна втома металів. Праці 13-го міжнародного колоквіуму (МВМ-2006), 25-28 вересня 2006 року — Т. : ТДТУ, 2006 — С. 36-41. — (Пленарні доповіді).
966-305-027-6 http://elartu.tntu.edu.ua/handle/123456789/16762 Tee K. F., Christopher C. J., James M. N., Patterson E. A. (2006) Mathematical study of the effects of applied stress, T-stress and back stress in photoelastic fringe patterns. Mechanical Fatigue of Metals: Proceeding of the 13-th International Colloquium (MFM) (Tern., 25-28 September 2006), pp. 36-41 [in English]. |
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| Language |
en
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| Relation |
ⅩⅢ міжнародний колоквіум „Механічна втома металів“
ⅩⅢ Internation Colloquium "Mechanical fatigue of metals" 1. Williams ML. On the stress distribution at the base of a stationary crack. J Appl Mech, 1957, 24, 109-114. 2. Wang X, Lewis T, Bell R. Estimations of the T-stress for small cracks at notches. Engng Fract Mech, 2006, 73, 366-375. 3. James MN, Pacey MN, Wei L-W. Patterson EA. Characterisation of plasticity-induced closure – crack flank contact force versus plastic enclave. Engng Fract Mech, 2003, 70, 2473-2487. 4. Pacey MN, James MN, Patterson EA. A new photoelastic model for studying fatigue crack closure. Expl Mech, 2005, 45(1), 42-52. 1. Williams ML. On the stress distribution at the base of a stationary crack. J Appl Mech, 1957, 24, 109-114. 2. Wang X, Lewis T, Bell R. Estimations of the T-stress for small cracks at notches. Engng Fract Mech, 2006, 73, 366-375. 3. James MN, Pacey MN, Wei L-W. Patterson EA. Characterisation of plasticity-induced closure – crack flank contact force versus plastic enclave. Engng Fract Mech, 2003, 70, 2473-2487. 4. Pacey MN, James MN, Patterson EA. A new photoelastic model for studying fatigue crack closure. Expl Mech, 2005, 45(1), 42-52. |
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| Rights |
© Тернопільський державний технічний університет імені Івана Пулюя
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| Format |
36-41
6 |
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| Coverage |
25-28 вересня 2006 року
25-28 September 2006 Україна, Тернопіль Ukraine, Ternopil |
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| Publisher |
ТДТУ
TDTU |
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